The vapor deposition furnace is a chemical equipment, and Xianyang Ceramic Research and Design Institute Co., Ltd. has been engaged in the production of this furnace for many years. Chemical Vapor Deposition (CVD) Furnace technology is mainly a method of generating thin films by chemical reactions on the substrate surface using one or several gaseous compounds or substances containing thin film elements. Chemical vapor deposition is a new technology developed in recent decades for the preparation of inorganic materials. The chemical vapor deposition method has been widely used for purifying substances, developing new crystals, and depositing various single crystal, polycrystalline, or glassy inorganic thin film materials. These materials can be oxides, sulfides, nitrides, carbides, or binary or multicomponent intermetallic compounds in the III-V, II-IV, IV-VI families, and their physical functions can be precisely controlled through the deposition process of gas-phase doping
Chemical vapor deposition technology is a process that uses gaseous substances to explain chemical reactions on solids and produce solid deposits. It roughly includes three steps:1) forming volatile substances
2) Transfer the above substances to the sedimentary area 3) Produce chemical reactions on solids and produce solid substances