Nowadays, many university laboratories and research institutes are using gas-phase deposition furnaces. Compared with other deposition methods, gas-phase deposition furnaces not only have the advantages of simple equipment operation, convenient maintenance, and strong flexibility, but also have a series of advantages:
(1) At medium and high temperatures, gas-phase deposition furnaces deposit solids through gas-phase chemical reactions between initial compounds in the gaseous state;
(2) gas-phase deposition furnaces can deposit solids at atmospheric pressure (atmospheric pressure) Or deposit at a pressure lower than atmospheric pressure, generally speaking, low-pressure effect is better
(3) The use of plasma and laser assisted technology in the vapor deposition furnace can significantly promote chemical reactions, allowing deposition to occur at lower temperatures (4) The chemical composition of the coating can be changed to obtain gradient deposits or mixed coatings (5) The density and purity of the coating can be controlled (6) Good coating performance, capable of depositing on complex shaped substrates and granular materials (7) Gas conditions are usually laminar and can form a thick boundary layer on the surface of the substrate (8) The sedimentary layer usually has a columnar crystal structure and is not resistant to bending, but through various techniques of gas phase perturbation of chemical reactions, fine-grained equiaxed sedimentary layers can be obtained (9) A vapor deposition furnace can form coatings of various metals, alloys, ceramics, and compounds. As long as the raw gas is slightly changed and different process parameters are used, deposition layers with different performance can be prepared; Can be coated with various complex shaped workpieces, such as workpieces with grooves, grooves, holes or blind holes; Strong adhesion between coating and substrate, etc